Suzhou CSE Semiconductor Equipment Techn

Features:  (1) each slot can  clean 2 baskets at the same time.&nbs

Name: phosphorus silicon glass cleaning machine Use: This equipment is mainly used for 

    Name:cleaning equipment before PR for substrate etching &nb

The device name: silicon developing machine which is mainly used for developing and fixing

1. Summary of equipment This equipment is used for cleaning substrate by washing, ï&

The device name: LCD etching equipment which  is suitable for wet ch

LCD/PDP/OLED cleaning machine and cleaning agent is mainly uesed for ITO/Cr glass cleaning the surface of the

Wet Bench Application：  Developing Process  Etching Process  Stripping Process  C

Application:   widely used in wet chemical process of chip in  IC production&nb

the cleaning object�is�2 to�8 inches ofï&i

Use: suitable for quartz and quartz tube of diameter 255cm , length 3300cm or smaller in semiconductor, &

This equipment is immersion cleaning machine. mainly used for  quartz &nb

Equipment overview:� Wafer drying machine has high�cleanlinessï

1 process; feeding,  spray,  etching,  rinsing,  etching,  spray, blanking

Semiconductor etching machine (semi automatic) (non-standard equipment)&n

1 Overview: This equipment can be used for developing and fixing on 2 "~8"&

Silicon rod cleaning machine 1.Process:Manually feeding,  corrosion,  water washing, overflo

Name : automatic silicon cleaning machine Uses: the main function is to carry out 

Equipment:� 1)Mainly used for textured etching and cleaning of single orï¿

Body material:Germany imported porcelain white PP board that is bended and welded after