Wet Bench By Suzhou CSE Semiconductor Equipment Techn, China
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Wet Bench

Wet Bench

FOB Price

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Minimum Order

Localité:

-

Prix de commande minimale:

-

Commande minimale:

1 Set

Packaging Detail:

standard export package

Delivery Time:

20 days

Supplying Ability:

1000 Set per Year

Payment Type:

T/T, L/C

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Suzhou CSE Semiconductor Equipment Techn

Suzhou CSE Semiconductor Equipment Techn

China

Membre gratuit

Personne à contacter Ms. Lily

NO.90, Taoxin RD, Rugao City, Nantong, Jiangsu

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Description

Wet Bench Application： 
Developing Process 
Etching Process 
Stripping Process 
Cleaning Process 
Mask Cleaner 
Suitable Size：2"*8" Wafer 
Product Type：Wet Bench or Wet station 
Operation Mode：Auto / Semi-Auto / Manual 
Specialty：Build-to-order available 
Available Option： 
Class **0 or ***0 
CIM Connect 
Chemical Supply System 
CO2 / IR 
PLC / PC Base / PAC 
Datalogic 
Temperature Measurement Data Acquisition System 
Product Feature： 
Use quality pipe and valve component 
Use PLC for electronic controller 
Robotic horizontal and vertical stroke for high accuracy, stability and positioning 
Quarantine zone for both acidic gas and electrical substance 
Flexible disposition scheme for QDR 
Modularized pipeline installment allows swift and convenient maintenance 
Product design is highly adaptable to fit in customized environment according to the actual needs  

CSE’s batch wet process systems, wet stations and wet benches are designed for silicon etch, wafer cleaning, and wafer stripping for wafers from **0 mm up to **0 mm, and include fully automatic, semi-automatic and manual options, with a choice of linear and rotary robotics. We has a solution to meet most wet etching, wet process, parts cleaning and wafer cleaning needs.

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Ms. Lily < Suzhou CSE Semiconductor Equipment Techn >

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