cleaning equipments before PR By Suzhou CSE Semiconductor Equipment Techn, China
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cleaning equipments before PR

cleaning equipments before PR

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Minimum Order

Localité:

-

Prix de commande minimale:

-

Commande minimale:

1 Set

Packaging Detail:

standard export package

Delivery Time:

20 days

Supplying Ability:

1000 Set per Year

Payment Type:

L/C, T/T

Contacter maintenant
Membre gratuit

Personne à contacter Ms. Lily

NO.90, Taoxin RD, Rugao City, Nantong, Jiangsu

Contacter maintenant

Description






 
 

Name:cleaning equipment before PR for substrate etching  in liquid crystal process

 

Dimensions: length ****0mm width ***0mm height ***0mm

 

Main material: shell: Germany imported PP plate

 

Product features:

 

1.the whole process is controlled by PLC, touch screen operation. The equipments tanks realize the flushing and removing function of  orresidual chemical liquid in the film and the pollution particle. It consists of  quick exhaust valve installed in the bottom of the groove,DI injection hole (including nitrogen bubbling)and   DI injection nozzle on both sides of the groove top realizing speedy injection and emission of tanks.

 

2.quick exhaust washing valve (QDR) is guaranteed by independent K**0 guarantee. It includes the process time, flushing times setting, work completion tips and troubleshooting  alarm in the process and state tips etc.

 

Note: the whole structure design of equipment is  reasonable , beautiful appearance, stable and reliable performance. Widely used in LCD industry.

Send a direct inquiry to this supplier

To:

Ms. Lily < Suzhou CSE Semiconductor Equipment Techn >

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