Nitrogen Trifluoride; Nitrogen Fluoride By Zibo Eyuan Import & Export Co. Ltd, China
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Nitrogen Trifluoride; Nitrogen Fluoride

Nitrogen Trifluoride; Nitrogen Fluoride

60 ~ 200 / Metric Ton

|

Minimum Order

Localité:

-

Prix de commande minimale:

Commande minimale:

5 Metric Ton

Packaging Detail:

cylinder

Delivery Time:

10days after order date

Supplying Ability:

600 Metric Ton per Month

Payment Type:

T/T, L/C

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Personne à contacter Kevin

Liuquan Road, Zibo, Shandong

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Description

Nitrogen Trifluoride; Nitrogen Fluoride
Basic Information
Product name: Nitrogen Trifluoride; Nitrogen Fluoride
CAS No.: ********2                 M.F: NF3                               M.S
Physical characteristic
Molecular weight Melting point Boiling point Critical temperature Critical pressure
*1.*1 ***6.8℃(1atm) ***9℃(1atm) **9.3℃ *4.*2atm(4.*6MPa)
 
Liquid density Gas density Solubility in water the normality of Danger classification
***4kg/m3(1atmat the boiling point) 2.*5kg/m3(1atm *1℃) 1.*3****5(1atm,*2℃) the 2.*-grade toxic gas. The maximum allowance content in air is *9mg/m3
Quality standard ( Q/**8J******3 )
Impurities NF3≥*9.**5% Vol.% NF3≥*9.*9% Vol.% NF3≥*9.*8% Vol.% NF3≥*9.9% Vol.%
CF4 ≤*0 Vol.ppm ≤*0 Vol.ppm ≤**0 Vol.ppm ≤**0 Vol.ppm
N2 ≤5 Vol.ppm ≤5 Vol.ppm ≤*0 Vol.ppm ≤*0 Vol.ppm
O2+Ar ≤3 Vol.ppm ≤5 Vol.ppm ≤*0 Vol.ppm ≤*0 Vol.ppm
CO2 ≤1 Vol.ppm ≤5 Vol.ppm ≤*0 Vol.ppm ≤*0 Vol.ppm
H2O ≤1 Vol.ppm ≤1 Vol.ppm ≤1 Vol.ppm ≤1 Vol.ppm
HF ≤1 Vol.ppm ≤1 Vol.ppm ≤1 Vol.ppm ≤1 Vol.ppm
SF6 ≤1 Vol.ppm ≤2 Vol.ppm ≤2 Vol.ppm ≤*5 Vol.ppm
N2O ≤1 Vol.ppm ≤5 Vol.ppm ≤*0 Vol.ppm ≤*0 Vol.ppm
CO ≤0.5 Vol.ppm ≤5 Vol.ppm ≤*0 Vol.ppm ≤*0 Vol.ppm
Package  
Cylinder(*7L), Bundle(*6×*7L), Bundle(*5×*7L), Y-Cylinder(**0L), ISO etc.
The steel cylinder
capacity
The steel
cylinder type
Valves Cylinder
 pressure
Gas mass Danger No. UN Code Package
classification
Package symbol
*7L,*3.3L,*0L,8L DOT*3AA,GB***9 CGA**0, CGA**0 9.***3.0MPa *2kg,*0kg
3.4kg
****6 ***1 â…¡ 6
Usage   
NF3 is a kind of excellent plasma etching gas which is used in microelectronics industry. During etching Si and SiN the pollution is free. NF3 is good at etching rate and selectivity, and it is a good cleaning agent.
 

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