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Personne àcontacter Ms. Wendy
Intcgrated the middle 25th, Beijing
High pure metal sputtering target:
Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In, Ag,Sn, graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn, Pb, Ir, Y, Ce, La, Yb, Gd, pt Target
High density ceramicsputtering target: ITO target, AZO target,IGZO target, MgO, Y2O3, Fe2O3, Ni2O3, Cr2O3, ZnO, ZnS, CdS, MoS2, SiO2, SiO, ZrO2, Nb2O5, TiO2, HfO2, TiB2, ZrB2, WO3, Al2O3, Ta2O5, MgF2, ZnSe, AlN, Si3N4, BN,TiN, SiC, LiNbO3, BaTiO3, LaTiO3, PrTiO3 target, etc.
Note: The ceramic target produced in CNM adopts the most advanced ceramic production technology-inert gas protection hot isostatic pressing sintering technology, the relative density is grater than ****9%. In addition, CNM could provide with the metalizing process of the target and unbounded services.
High pure alloy sputtering target: Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al Alloy target, Cu-Im Alloy target, Cu-Ga Alloy target, Cu-Im-Ga Alloy target, Cu-Im-Ga-Se Alloy target, stainless steel target, Zn-Al Alloy target,W-Ti Alloy target, Fe-Cot Alloy target, etc
High quality vacuum coating material: 4N*5N
1. Oxide: SiO, SiO2, TiO2, ZrO2, HfO2, TiO, Ti3O5, Nb2O5, Ta2O5, Y2O3 etc. high purity Oxide coating materials.
2. fluoride: NbF3, BaF2, CeF3, MgF2, LaF3, YF3, YbF3, ErF3 etc. high purity Fluoride coating materials.
3. other compound: ZnS, ZnSe, TiN, SiC, LaTiO3, BaTiO3, SrTiO3, PrTiO3,CdS etc. other compounds vacuum coating materials.
4. metal coating material: high pureAl, Cu, Ti, Si, Au, Ag, Im, Mg, Zn, Pt, Ge, Ni, Au-Ge Alloy, Au-Ni Alloy, Ni-Cr Alloy, Ti-Al Alloy, Cu-Im-Ga Alloy, Ci-Im-Ga-Se Alloy, Zn-Al Alloy, etc. Metal coating materials.
