FOB Price
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Minimum Order
Localité:
China
Prix de commande minimale:
-
Commande minimale:
1 Piece
Packaging Detail:
bags, vacuumized
Delivery Time:
7-15 days
Supplying Ability:
-
Payment Type:
T/T, L/C, Western Union, Money Gram
Personne àcontacter Ms. Wendy
Intcgrated the middle 25th, Beijing
CNM could provide high quality target materialfor the field of electrical and semiconductor devices, flat panel display, architectural and automotive glass, thin film solar cell, magnetic storage, instrument, decorate thin film, etc.
High pure metal sputtering target:
Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In, Ag,Sn, graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn, Pb, Ir, Y, Ce, La, Yb, Gd, pt Target
High density ceramicsputtering target: ITO target, AZO target,IGZO target, MgO, Y2O3, Fe2O3, Ni2O3, Cr2O3, ZnO, ZnS, CdS, MoS2, SiO2, SiO, ZrO2, Nb2O5, TiO2, HfO2, TiB2, ZrB2, WO3, Al2O3, Ta2O5, MgF2, ZnSe, AlN, Si3N4, BN,TiN, SiC, LiNbO3, BaTiO3, LaTiO3, PrTiO3 target, etc.
Note: The ceramic target produced in CNM adopts the most advanced ceramic production technology-inert gas protection hot isostatic pressing sintering technology, the relative density is grater than ****9%. In addition, CNM could provide with the metalizing process of the target and unbounded services.
High pure alloy sputtering target:Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al Alloy target, Cu-Im Alloy target, Cu-Ga Alloy target, Cu-Im-Ga Alloy target, Cu-Im-Ga-Se Alloy target, stainless steel target, Zn-Al Alloy target,W-Ti Alloy target, Fe-Cot Alloy target, etc
Note:CNM product high purity Alloy sputtering target: tiny grain size number (*****0um), high relative density (****9.9%), high purity (*9.***9.**9%).
In addition, CNM provides with the metalizing process of the target materials and unbounded services.
