Niobium Oxide sputtering target film By China Rare Metal Material Co., Ltd,
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Niobium Oxide sputtering target film
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Niobium Oxide sputtering target film

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China Rare Metal Material Co., Ltd

China Rare Metal Material Co., Ltd

China

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Personne à contacter Susan

Honggu Avenue No.1376, Nanchang, Jiangxi

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La description

China Rare Metal Material Co., Ltd produce kinds of sputtering targets for flat panel display as below: Alumina doped Zinc Oxide sputtering targets (AZO), Tin doped indium Oxide sputtering target (ITO) Niobium Oxide sputtering target(Nb2O5, NbOx) Magnesium fluoride sputtering target (MgF2) Molybdenum Niobium sputtering target (MoNb), Mo(*0)Nb(*0)wt% Antimony dopedTin Oxide sputtering target ,ATO(Sb2O3:SnO2) Silicon sputtering target (Si) Silicon Aluminum sputtering target (SiAl) Titanium Oxide sputtering target (TiOx, TiO2, TiO ) Niobium doped Titanium Oxide sputtering target (TiOxNb) biggest size: Disc *8 inch（**7.2mm) diameter Rectangle :**0mmx**5mm or **0mmx**0mm or **0mmx**0mm or **0x**0mm Relative Density: *9%min produce way: hot pressing Production Capacity: about ***0kg per month

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Mots-clés correspondants China Rare Metal Material Co., Ltd

Lanthanum Hexaboride(LaB6) sputtering target Lanthanum Hexaboride(LaB6) sputtering target
Molybdenum Niobium sputtering target Molybdenum Niobium sputtering target
Tantalum pentoxide, Ta2O5 sputtering targets, Ta2Ox sputtering target Tantalum pentoxide, Ta2O5 sputtering targets, Ta2Ox sputtering target
lanthanum fluoride, LaF3 lanthanum fluoride, LaF3
Aluminium Silicon Copper sputtering target Aluminium Silicon Copper sputtering target
Molybdenum Sulfide (MoS2) sputtering target flim Molybdenum Sulfide (MoS2) sputtering target flim
Magnesium Fluoride MgF2 sputtering target Magnesium Fluoride MgF2 sputtering target

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