Lanthanum Hexaboride(LaB6) sputtering target By China Rare Metal Material Co., Ltd,
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Lanthanum Hexaboride(LaB6) sputtering target
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Lanthanum Hexaboride(LaB6) sputtering target

Prix FOB

Obtenir le dernier prix

( Negotiable )

|

1 Bag Minimum Order

Pays:

China

N ° de modèle:

CRM

Prix FOB:

( Negotiable ) Obtenir le dernier prix

Localité:

China

Prix de commande minimale:

-

Commande minimale:

1 Bag

Packaging Detail:

Vacuum packing for export

Heure de livraison:

2 weeks

Capacité de Fournir:

500 Kilogram per Month

Payment Type:

T/T

Groupe de produits :

-

Contacter maintenant
China Rare Metal Material Co., Ltd

China Rare Metal Material Co., Ltd

China

Membre gratuit

Personne à contacter Susan

Honggu Avenue No.1376, Nanchang, Jiangxi

Contacter maintenant

Spécification du produit

  • Type: Ceramic Parts
  • Application: Industrial Ceramic
  • Brand Name: CRM

La description

China Rare Metal Material Co., Ltd produce kinds of sputtering targets for flat panel display as below: Alumina doped Zinc Oxide sputtering targets (AZO), Tin doped indium Oxide sputtering target (ITO) Niobium Oxide sputtering target(Nb2O5, NbOx) Magnesium fluoride sputtering target (MgF2) Molybdenum Niobium sputtering target (MoNb), Mo(*0)Nb(*0)wt% Antimony dopedTin Oxide sputtering target ,ATO(Sb2O3:SnO2) Silicon sputtering target (Si) Silicon Aluminum sputtering target (SiAl) Titanium Oxide sputtering target (TiOx, TiO2, TiO ) Niobium doped Titanium Oxide sputtering target (TiOxNb) biggest size: Disc *8 inch（**7.2mm) diameter Rectangle :**0mmx**5mm or **0mmx**0mm or **0mmx**0mm or **0x**0mm Relative Density: *9%min produce way: hot pressing Production Capacity: about ***0kg per month

Pays: China
N ° de modèle: CRM
Prix FOB: ( Negotiable ) Obtenir le dernier prix
Localité: China
Prix de commande minimale: -
Commande minimale: 1 Bag
Packaging Detail: Vacuum packing for export
Heure de livraison: 2 weeks
Capacité de Fournir: 500 Kilogram per Month
Payment Type: T/T
Groupe de produits : -

Mots-clés correspondants China Rare Metal Material Co., Ltd

Niobium Oxide sputtering target film Niobium Oxide sputtering target film
Molybdenum Niobium sputtering target Molybdenum Niobium sputtering target
Tantalum pentoxide, Ta2O5 sputtering targets, Ta2Ox sputtering target Tantalum pentoxide, Ta2O5 sputtering targets, Ta2Ox sputtering target
lanthanum fluoride, LaF3 lanthanum fluoride, LaF3
Aluminium Silicon Copper sputtering target Aluminium Silicon Copper sputtering target
Molybdenum Sulfide (MoS2) sputtering target flim Molybdenum Sulfide (MoS2) sputtering target flim
Magnesium Fluoride MgF2 sputtering target Magnesium Fluoride MgF2 sputtering target

Mots-clés correspondants

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Susan < China Rare Metal Material Co., Ltd >

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