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China
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Localité:
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Commande minimale:
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L/C, T/T
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Personne àcontacter John
qianjing road, Beijing, Beijing
A. System description:
This system is a dual chamber vertical box type structure three
gumming multi-function in high vacuum magnetron sputtering coating
equipment. This system for the continuous large flat-panel display
coating pilot equipment, special on the flat glass production of
multilayer metal film and ITO film and insulating film and ion
cleaning before coating and the coating after eliminating stress
annealing for completion. It is mainly composed of vacuum system,
pressure control system, pneumatic system, electrical system,
rectangular sputtering target (including twin sputtering target)
and sputtering power supply, cooling system, sample system, heating
and annealing samples ion cleaning system, plate transfer system,
automatic control and alarm protection system, etc. Vertical
structure can avoid target surface and the surface layer of
membrane pollution caused by fall into the impurities and
impurities target caused by short circuit, which can guarantee the
purity of the membrane layer, and can guarantee the stability of
equipment normal work and the safety of operating personnel.
This system includes sputtering chamber and into the sample chamber
(room) and annealing.
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Technical indicators:
1. Vertical box type double chamber structure: measures about L***0
* H**0MM W**0 stainless steel material (including sample/annealing
chamber, sputtering chamber; the middle for the load lock
isolation), indoor lighting and pneumatic manipulator and
reciprocating motion system;
2. The sputtering materials: metal, ITO film, insulation film,
etc
3. The three sets of ***0 l/s compound molecular pump vacuum
system; And a set of MKS pressure control system of the United
States.
Limiting vacuum sputtering chamber: 8 x ***5 pa sample limiting
vacuum chamber: 2 x ***4 pa;
Abstract: 4. The extraction rate from atmospheric pressure to *0 Pa
within the time for 5 minutes, using molecular pumped into *0 e - 4
Pa takes *0 minutes. Step-up ratio: stop after the chamber and the
high vacuum, pressure rise is not more than *0 pa *2 hours
later
5. Sample size: no more than L**0mm x W**0mm
6. Two rectangular target (the size of target is: delta W**0 L**0 *
* 8 mm) and the twin sputtering target (target material for: delta
W*0 L**0 * * 8 mm), RF/DC/intermediate frequency each one bipolar
pulse sputtering power; Samples and the spacing between the target
material: ****0 - mm is adjustable
7. Coating non-uniformity, plus or minus 5% or less; Coating
repeatability: better than + / - 5%; The plating film adhesion test
(using adhesive tape)
8. The maximum deposition rate: **0 or more A/min (Cr, Al, Cu)
9. Sputtering chamber pressure the MKS automatic pressure control
instrument control: Pa 0.1 ~ 5 Pa (plus or minus 5% accuracy), a
set of;
*0. Four road intake and MFC control argon, hydrogen (**0 SCCM);
Oxygen, nitrogen (each **0 SCCM), and form a complete set of well
gas and cut-off valve control; Process parameters can be computer
control and storage;
*1. Samples of heating and annealing temperature: heating plate (at
room temperature to **0 + 2 ); Annealing (at room temperature to
**0 plus or minus 2 )
Annealing temperature uniformity: samples within the scope of
temperature difference is less than + / - 5Â
Substrate heating system with the samples
*2. The samples can be to online plasma cleaning
*3. The automatic control system adopts industrial computer and PLC
control, touching screen operation, can choose automatic and manual
mode. Implementation process and equipment operation stability
control, high stability and repeatability.
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| Pays: | China |
| N ° de modèle: | - |
| Prix FOB: | Obtenir le dernier prix |
| Localité: | - |
| Prix de commande minimale: | - |
| Commande minimale: | 1 |
| Packaging Detail: | - |
| Heure de livraison: | - |
| Capacité de Fournir: | - |
| Payment Type: | L/C, T/T |
| Groupe de produits : | - |
