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Personne àcontacter Ms. Xiaoying
No.55 XinHan Road,XinChang Industrial Park,Pudong,Shanghai,China, Shanghai, Shanghai
***4 is our company latest product with silane cross link sioplas technique. It is specially used for 1kv below cable and wire, composed by *5% silane crosslinkable low density polyethylene (compound A) and 5% catalysis (compound B). It has a wide range of processing temperature, outstanding performance, easy processing and excellent properties. Please contact us for more details.