Protech PECVD system for thin film coating

La description

PT****0T*4CVDPE is a compact CVD system. It consists of Plasma RF power source, split tube furnace, 4 channels mass flow meter with gas mixing tank and high quality mechanical pump. The CVD system is mainly used for deposit thin film even in nano-scale, from a gas state to a solid state, such as, diamond CVD coating, graphene growth, etc. 

Outstanding features 

1)Solid surface can be threat with plasma power
2)Gas flow can be accurately controlled by the gas mixer 
3)Suitable for different material of deposition, including, SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si:H) deposition.

Main technical data

Name    Item     Data
1) RF power     Max. power    **0W
    RF frequency     *3.*6MHz 
    Reflection power    **0W
    RF power output port    *0Ώ
    Cooling     **8~**0VAC
2) Preheating furnace    Max. temperature    ***0C
    Working temperature    0~***0C
    Temperature control    Digital programmable and PID automatic control
    Temperature accuracy     +/*1.C
    Working chamber    Dia. *0x **0x***0mmLength
    Power supply    **8V~**0V, *0/*0Hz 
3)Anti-corrosive pressure gauge    Brand     Inficon 
    Type    Anti-corrosive, gas-type independent
        high accuracy and reproducibility at atmosphere
        Easy to change plug and play sensor element
4) Vacuum pump set    Max. Vacuum pressure    *0E*2Torr 
    Type    Heavy duty rotary vane vacuum pump 
    Model    PT-RT*4
5) Gas mixer tank        Four precise MFC with digital display to control the gas flow automatically
    MFC1    Flow range from 0~**0sccm
    MFC2    Flow range from 0~**0sccm
    MFC3    Flow range from 0~**0sccm
    MFC4    Flow range from 0~***0sccm
        The flow range are optional according to your concrete working condition
        Needle valve and connect tubes are also included