oxide ceramic sputtering target By Huizhou Tian Yi Rare Material Co., Ltd,

SpÃ©cification du produit

Grade Standard: Electron Grade
Purity (%): 99.99%
Application: thin film coating and evaporation
Brand Name: TYR

aluminum oxide Al2O3 target:niobium oxide Nb2O5 target
hafnium oxide HfO2 target:tantalum oxide Ta2O5 target
Zirconium oxde ZrO2 target:titnaium oxide TiO2 target
vanadium oxide V2O5 target:gallium oxide Ga2O3 target
yttrium oxide Y2O3 target:boron oxide B2O3 target
cerium oxide CeO2 target:IGZO target
indium oxide In2O3 target:Barium Titanate BaTiO3 target
Chromium Oxide Cr2O3 target :copper oxide Cu2O target
Gadolinium Oxide Gd2O3 target:Erbium Oxide Er2O3 target
Indium Zinc Oxide, In2O3-ZnO, IZO target:Indium Gallium Zinc Oxide, IGZO, In2O3+Ga2O3+ZnO target

La description

TYR material supply all kinds of ceramic sputtering target , compound semiconductor target include Oxide sputtering target , Fluoride sputtering target , Boride sputtering target , Carbide sputtering target , Nitride sputtering target , Sulfide sputtering target , Selenide sputtering target , Silicide sputtering target , Telluride sputtering target , Antimonide sputtering target , Arsenide sputtering target ......

The available made method include hot pressing , HP, , hot/cold isostatic pressing , HIP, CIP, , and vacuum melting, vacuum sintering

Spec.: Diameter: **5.6mm , *4", max. Single piece Size: Length: 1mm, if larger size than this, we can do it as tiles joint by *5 degree or *0 degree.
Shape: discs, plate, rod, tube, sheet, Delta, Rotatable and per drawing

TYR will base on each different material to select the best way to made it and sure the finish ceramic sputtering target to be best.

Oxide Ceramic sputtering target :
Aluminum Oxide , Al2O3             Antimony Oxide , Sb2O3
Antimony:Tin Dioxide , Sb:SnO, ATO    Barium Titanate , BaTiO3
Bismuth Oxide , Bi2O3               Cerium oxide , CeO2
Cerium fluoride , CeF3               Chromium Oxide ,CrO, Cr2O3
Copper Oxide , CuO                 Dysprosium Oxide , Dy2O3
Erbium Oxide , Er2O3               Europium Oxide , Eu2O3
Gadolinium Oxide , Gd2O3           Hafnium Oxide, HfO2
Holmium Oxide , Ho2O3             Indium Tin Oxide, In2O*-SnO2, ITO
Indium Zinc Oxide, In2O*-ZnO, IZO   Indium Oxide , In2O3
Indium Gallium Zinc Oxide, IGZO , In2O3+Ga2O3+ZnO
Iron Oxide , Fe2O3, Fe3O4           Lanthanum Aluminate , LaAl2O3,
LSMO , La0.*7Sr0.*3MnO3
Lead Zirconate , PbZrO3            Lead Oxide, PbO
Lead Titanate , PbTiO3                Lead Zirconate , PbZrO3
Lead Zirconate-Titanate, PZT , PbZrO3 + PbTiO3
Lutetium Oxide , Lu2O3
Magnesium Oxide , MgO              Molybdenum Oxide , MoO
Molybdenum Oxide , MoO3,            Neodymium Oxide , Nd2O3,
Nickel Oxide, NiO                    Niobium Pentoxide , Nb2O5, Nb2Ox
Neodymium Oxide , Nd2O3,            Nickel Oxide, NiO
Praseodymium Oxide , Pr6O*1,          Samarium Oxide , Sm2O3
Scandium Oxide , Sc2O3                Silicon Monoxide , SiO
Silicon Dioxide , SiO2                  Strontium Titanate , SrTiO3,
Tantalum Pentoxide , Ta2O5,            Terbium Oxide , Tb4O7
Thulium Oxide , Tm2O3               Titanium Oxide , Ti2O3, Ti3O5
Titanium Monoxide , TiO                Titanium Dioxide , TiO2
Tungsten Oxide , WO3, WO2.9, WO3 doped Li2O
Vanadium Pentoxide , V2O5, VO2        Yttrium Oxide , Y2O3
Ytterbium Oxide , Yb2O3
Zinc Oxide , ZnO                     Zinc Aluminum Oxide, AZO , Al2O*-ZnO, ZnO-Al
Ga2O3 doped ZnO , GZO               Zirconium oxide , ZrO2
ZrO2 - Y2O3 stabilized , YSZ,           ZrO2 + SiO2

~Fluoride Ceramic sputtering target
Aluminum Fluoride , AlF3 target
Barium Fluoride , BaF2 target
Cadmium Fluoride , CdF2 target
Calcium Fluoride, CaF2 target
Cerium Fluoride , CeF3 target
Dysprosium Fluoride , DyF3 target
Erbium Fluoride , ErF3 target
Lanthanum Fluoride, LaF3 target
Lithium Fluoride , LiF target
Magnesium Fluoride, MgF2 target
Neodymium Fluoride, NdF3 target
Potassium Fluoride , KF, target
Praseodymium Fluoride , PrF3 target
Lead Fluoride , PbF2 target
Sodium Fluoride , NaF target
Strontium Fluoride , SrF3 target
Samarium Fluoride , SmF3 target
Cryolite Na3AlF6 target
Ytterbium Fluoride , YbF3 target
Yttrium Fluoride , YF3target

Boride Ceramic sputtering target
Chromium Boride , Cr2B, CrB2, CrB, Cr5B3 target
Hafnium Boride , HfB2 target
Iron Boride , FeB target
Lanthanum Boride , LaB6 target
Molybdenum Boride , Mo2B, Mo2B5 target
Neodymium Boride , NdB, NdB2 target
Tantalum Boride , TaB, TaB2 target
Titanium Boride, TiB2 target
Tungsten Boride , WB, WB2, W2B5 target
Vanadium Boride , VB, VB2 target
Zirconium Boride , ZrB2 target

Carbide Ceramic sputtering target
Boron Carbide, B4C target
Chromium Carbide , Cr3C2, CrC target
Hafnium Carbide, HfC target
Molybdenum Carbide , Mo2C target
Niobium Nitride , NbC target
Silicom Carbide , SiC target
Tantalum Carbide , TaC target
Titanium Carbide, TiC target
Titanium Carbon Nitride , TiCN target
Tungsten Carbide , W2C, WC target
Tungsten Carbide Doped with Nickel , WC+Ni target
Tungsten Carbide Doped with Cobalt , WC+Co target
Vanadium Carbide , VC target
Zirconium Carbide, ZrC target

Nitride Ceramic sputtering target
Aluminum Nitride , AlN target
Boron Nitride, BN target
Hafnium Nitride, HfN target
Niobium Niride , NbN target
Silicom Nitride , Si3N4 target
Tantalum Nitride , TaN target
Titanium Carbon nitride , TiCN target
Titanium Nitride, TiN target
Vanadium Nitride , VN target
Zirconium Nitride , ZrN target

Sulfide Ceramic sputtering target
Cadmium Sulfide , CdS target
Copper Sulfide, CuS,Cu2S target
Indium Sulfide , In2S3 target
Iron Sulfide, FeS, FeS2 target
Lead Sulfide , PbS target
Manganese Sulfide, MnS2 target
Molybdenum Sulfide , MoS2 target
Niobium Sulfide , NbS2 target
Silver Sulfide , AgS. Ag2S target
Tantalum Suflfide , TaS2 target
Tin Sulfide , SnS, SnS2 target
Tungsten Sulfide , WS2 target
Zinc Sulfide , ZnS target

Silicide Ceramic sputtering target
Chromium Silicide , CrSi2 target
Cobalt Silicide , Co3Si target
Hafnium Silicide , HfSi2 target
Molybdenum silicide, MoSi2, Mo5Si3 target
Nickel Silicide , NiSi target
Niobium Silicide , Nb5Si3, NbSi2 target
Tantalum Silicide , Ta5Si3, TaSi2 target
Titanium silicide, Ti5Si3, TiSi2 target
Tungsten Silicide , WSi2 target
Vanadium silicide , V3Si, VSi2 target
Zirconium Silicide , ZrSi2 target

Selenide Ceramic sputtering target
Aluminum Selenide , Al2Se3 target
Antimony Selenide , Sb2Se3 target
Arsenic Selenide , As2Se3 target
Bismuth Selenide, Bi2Se3 target
Cadmium Selenide , CdSe target
Copper Selenide, CuSe, Cu2Se target
Gallium Selenide, Ga2Se3 target
Gernium Selenide, GeSe target
Indium Selenide, In2Se3 target
Lead Selenide, PbSe target
Molybdenum Selenide, MoSe2 target
Manganese Selenide, MnSe target
Niobium Selenide , NbSe2 target
Tantalum Selenide , TaSe2 target
Tungsten Selenide , WSe2 target
Zinc Selenide , ZnSe target

Antimonide sputtering target
Indium Antimonide , InSb target
Gallium Antimonide , GaSb target
Nickel Antimonide , NiSb target

Arsenide sputtering target
Indium Arsenide , InAs target
Tin Arsenide , SnAs target
Gallium Arsenide , GaAs target

Telluride sputtering target
Arsenic Telluride , As2Te3 target
Antimony Telluride, SbTe, Sb2Te3 target
Bismuth Telluride , Bi2Te3, BiTe target
Bismuth Antimony Telluride , Bi-Sb-Te target
Cadmium Telluride, CdTe target
Copper Telluride , CuTe, Cu2Te target
Gallium Telluride , GaTe target
Geranium Telluride , GeTe target
Geranium Antimony Telluride , Ge-Sb-Te target
Lead Telluride , PbTe target
Tin Telluride, SnTe target
Molybdenum Telluride, MoTe2 target
Niobium Telluride, NbTe2 target
Silver Telluride, Ag2Te target
Tantalum Telluride, TaTe2 target
Tungsten Telluride , WTe2, sputtering target
Zinc Telluride , ZnTe target

Pays:	China
N Â° de modÃ¨le:	sputtering targets
Prix FOB:	150 ~ 10000 / Piece (Negotiable) Obtenir le dernier prix
LocalitÃ©:	China
Prix de commande minimale:	150 per Piece
Commande minimale:	1 Piece
Packaging Detail:	vacuum packing
Heure de livraison:	2-4 weeks
Capacité de Fournir:	10000 Piece per Year
Payment Type:	T/T
Groupe de produits :	sputtering target