Prix FOB
Obtenir le dernier prix30000 ~ 30000 USD /
|1 Unit Minimum Order
Pays:
South Korea
N ° de modèle:
FI20620-1
Prix FOB:
30000 ~ 30000 USD / Obtenir le dernier prix
Localité:
Japan
Prix de commande minimale:
30000
Commande minimale:
1 Unit
Packaging Detail:
-
Heure de livraison:
1 month
Capacité de Fournir:
1 Unit per Month
Payment Type:
T/T
Groupe de produits :
-
South Korea
Personne àcontacter KING LEE
Remote plasma source, also known as remote high-density plasma generator, is the core equipment in semiconductor and chip manufacturing processes. It uses ionized fluorine to clean the silicon dust deposited inside the chip structure. In semiconductor and chip manufacturing processes, with time increasing, a large amount of silicon dust will be deposited inside and on the surface of the chip. Remote plasma source can provide a large amount of ionized fluorine to corrode various structures under vacuum conditions Carve clear selection. Due to the remote plasma cleaning method, which indirectly generates plasma while separating the plasma generator from the chip process chamber, it can achieve rapid cleaning without damaging the cavity, i.e. achieving! Ion process.
| Pays: | South Korea |
| N ° de modèle: | FI20620-1 |
| Prix FOB: | 30000 ~ 30000 / Obtenir le dernier prix |
| Localité: | Japan |
| Prix de commande minimale: | 30000 |
| Commande minimale: | 1 Unit |
| Packaging Detail: | - |
| Heure de livraison: | 1 month |
| Capacité de Fournir: | 1 Unit per Month |
| Payment Type: | T/T |
| Groupe de produits : | - |
